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                                    Published
                            
                Manufacturing & Production
            
Nm-scale Insulating Thin Films
                Researchers in Stanford’s Nanoscale Prototyping Laboratory have developed a low-temperature process for fabricating etch-resistant, pinhole-free spacer dielectrics a few nanometers
            
By
                            Stanford University
                        
Reference Number  
                04172
            
Last Update  
                 Nov 15, 2021
            
                                    Published
                            
                Manufacturing & Production
            
Arrays for Memory and Logic 
                This invention could provide an attractive option for low volume integrated circuits at the most advanced technology nodes that require quick time to market.
            
By
                            Cindy Chepanoske
                        
Reference Number  
                03373
            
Last Update  
                 Nov 15, 2021
            
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